article thumbnail

[Guest post] Works of applied art – the difference between design and copyright law

The IPKat

Here’s what Henning writes: Works of applied art – the difference between design and copyright law by Henning Hartwig I. If this qualifying criterion were to be relinquished, design law would ultimately become obsolete. This is the price for the fact that the author can and should create completely without purpose.

article thumbnail

Protecting Semiconductor Chip Design under the Semiconductor Chip Protection Act of 1984 (SCPA) – Part I (Registration and Inspection)

Intellectual Property Law Blog

Mask work is a type of intellectual property protection designed to protect layout designs (topographies) of integrated circuits. Under the SCPA, a mask work is a series of related images that forms a design or part of a design used to produce an integrated circuit. Copyright Office by year for the last 10 years.

Insiders

Sign Up for our Newsletter

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

article thumbnail

The Impact of REULA on Copyright Law: Navigating the Post-Brexit Landscape

Kluwer Copyright Blog

Although the lower courts are still bound by the decisions of the higher courts and their precedents set in light of EU law, they may refer the points of law to certain higher courts under section 6A. REULA’s influence on copyright law Although EU law had a strong influence on the UK copyright law, the two were never properly aligned.

article thumbnail

Protecting Semiconductor Chip Design under the Semiconductor Chip Protection Act of 1984 (SCPA) – Part I (Registration and Inspection)

Intellectual Property Law Blog

Understanding Mask Work Mask work is a type of intellectual property protection designed to protect layout designs (topographies) of integrated circuits. Under the SCPA, a mask work is a series of related images that forms a design or part of a design used to produce an integrated circuit. Copyright Office.

article thumbnail

Guest Post: Old Designs, New Design Patents

Patently-O

In December 2020, the USPTO put out a request for comments on “The Article of Manufacture Requirement.” (For Last week, at Design Day 2022, the USPTO announced that it had completed its summary of those comments. But projected designs aren’t new. Projected designs are simply not some new, unforeseen concept.

article thumbnail

3 Count: Copyright Claims Onboarding

Plagiarism Today

Copyright Office announces that the Copyright Claims Board (CCB) has launched its new website, ccb.gov. The CCB became a reality in December 2020 when the U.S. government passed the Copyright Alternative in Small-Claims Enforcement Act of 2020 (CASE Act).

Copyright 186
article thumbnail

If copyright law won’t protect small fashion brands against copying, social media will – just ask influencer Danielle Bernstein

JIPEL Copyright Blog

How does an influencer and fashion designer become so despised? In this case, via alleged copyright infringement. Nordstrom removed the pieces at issue, and everything seemed to be fine on the copying front—until 2020 hit. Danielle Bernstein is a 28-year-old New York City influencer and founder of the brand We Wore What (“WWW”).